The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2013

Filed:

Apr. 26, 2012
Applicants:

Jun Yamamuro, Oita, JP;

Masaki Ohsumi, Yokosuka, JP;

Masahisa Watanabe, Yokohama, JP;

Keiji Edamatsu, Kawasaki, JP;

Inventors:

Jun Yamamuro, Oita, JP;

Masaki Ohsumi, Yokosuka, JP;

Masahisa Watanabe, Yokohama, JP;

Keiji Edamatsu, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/015 (2006.01); B41J 2/135 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for manufacturing a liquid discharge head provided with a substrate which has a layer made of silicon nitride and with a discharge port forming member which is disposed above the layer made of silicon nitride and has a discharge port for discharging liquid. The method includes providing a photosensitive layer that is to be the discharge port forming member above the layer made of silicon nitride, and forming the discharge port by exposing the photosensitive layer to i-line. The layer made of silicon nitride has a refractive index of 2.05 or more to light of a wavelength of 633 nm and irradiation with the i-line is performed in the exposure.


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