The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
Jan. 07, 2010
Lendon L. Bendix, Melbourne, FL (US);
Barry G. Grossman, Melbourne, FL (US);
Mathew M. Kincaid, Indialantic, FL (US);
Jon Tower, Indialantic, FL (US);
Lendon L. Bendix, Melbourne, FL (US);
Barry G. Grossman, Melbourne, FL (US);
Mathew M. Kincaid, Indialantic, FL (US);
Jon Tower, Indialantic, FL (US);
Harris Corporation, Melbourne, FL (US);
Abstract
Systems () and methods () for measuring geometric changes of a passive material () when heat and pressure are applied thereto. The methods involve forming a pad () on a passive material panel (). The pad includes at least one of a layer of a passive material () and a layer of a metal (). The methods also involve coupling an interferometer () to the pad. The method also involves forming a multi-layer structure by placing at least one substrate panel () on top of the passive material such that an aperture () formed in the substrate panel is aligned with the pad. Pressure and heat are applied to the multi-layer structure. Data is collected using the interferometer while the pressure and heat are applied to the multi-layer structure. The interferometer can include, but is not limited to, a Fabry-Perot interferometer, a Michelson interferometer and/or a Mach-Zehnder interferometer.