The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
Apr. 02, 2010
Applicant:
Hitoshi Hatada, Sagamihara, JP;
Inventor:
Hitoshi Hatada, Sagamihara, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure method for exposing a plate with an image of a pattern of a mask comprises: reciprocating the mask along X direction, synchronizing a movement of the mask and a movement of the plate to +X direction, projecting an image of a first pattern of the mask onto the plate as an erected image with respect to +X direction during a first period in which the mask that is reciprocating is moved in +X direction, and projecting an image of a second pattern of the mask onto the plate as an inverted image with respect to +X direction during a second period in which the mask that is reciprocating is moved in −X direction.