The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2013

Filed:

Jan. 15, 2009
Applicants:

Dani Raphaeli, Kfar Saba, IL;

Guy Shasha, Or-Yehuda, IL;

Inventors:

Dani Raphaeli, Kfar Saba, IL;

Guy Shasha, Or-Yehuda, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03L 7/085 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for generating an UWB pulses based on LC oscillator topology. Fast turn on of the oscillator is achieved by creating large asymmetry in a normally symmetrical topology which is used in a typical differential type oscillator. One method for achieving large asymmetry is activating one branch of a differential pair of branches for a short duration before activating both branches in a normal operation. The bandwidth of the pulse is controlled by modifying the duration of the oscillator activation. Fast turn on and turn off is essential for high bandwidth generation. The method is adaptable for generating binary phase shift keying (BPSK) modulation. Selecting the activated branch of a fully symmetrical topology controls the output phase and creates two possibilities which differ exactly by 180 degrees. In a preferred embodiment, all the pulse generator components are on-clip leading to a low cost solution. The circuit can generate high power pulses directly on a load. It is also an option to add an amplifier to drive the output and separate the load from the oscillator. This method generate high power, stable pulses under varying practical conditions like process changes, VDD changes and temperature changes.


Find Patent Forward Citations

Loading…