The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2013

Filed:

Oct. 27, 2010
Applicants:

Hyeong-geun an, Gyeonggi-do, KR;

Dong-ho Ahn, Gyeonggi-do, KR;

Young-soo Lim, Chungcheongbuk-do, KR;

Yong-ho Ha, Gyeonggi-do, KR;

Jun-young Jang, Gyeonggi-do, KR;

Dong-won Lim, Seoul, KR;

Gyeo-re Lee, Seoul, KR;

Joon-sang Park, Seoul, KR;

Han-bong Ko, Gyeonggi-do, KR;

Young-lim Park, Gyeonggi-do, KR;

Inventors:

Hyeong-Geun An, Gyeonggi-do, KR;

Dong-Ho Ahn, Gyeonggi-do, KR;

Young-Soo Lim, Chungcheongbuk-do, KR;

Yong-Ho Ha, Gyeonggi-do, KR;

Jun-Young Jang, Gyeonggi-do, KR;

Dong-Won Lim, Seoul, KR;

Gyeo-Re Lee, Seoul, KR;

Joon-Sang Park, Seoul, KR;

Han-Bong Ko, Gyeonggi-do, KR;

Young-Lim Park, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 47/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A nonvolatile memory cell includes a substrate and a phase changeable pattern configured to retain a state of the memory cell, on the substrate. An electrically insulating layer is provided, which contains a first electrode therein in contact with the phase changeable pattern. The first electrode has at least one of an L-shape when viewed in cross section and an arcuate shape when viewed from a plan perspective. A lower portion of the first electrode may be ring-shaped when viewed from the plan perspective. The lower portion of the first electrode may also have a U-shaped cross-section. An upper portion of the first electrode may also have an arcuate shape that spans more than 180° of a circular arc.


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