The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
May. 13, 2011
Muir Kumph, Innsbruck, AT;
Muir Kumph, Innsbruck, AT;
Universität Innsbruck, Innsbruck, AT;
Abstract
An apparatus and a method for trapping charged particles and performing controlled interactions between them are provided. The apparatus includes a substrate and RF electrodes and dedicated DC electrodes arranged on the substrate and configured to generate a trapping potential for trapping the charged particles above the substrate. The RF and dedicated DC electrodes include at least one RF trapping electrode configured to be driven with an RF voltage for contributing to the trapping potential, an array of two or more trapping site DC electrodes configured to be biased with a DC voltage for contributing to the trapping potential, and a first individually drivable RF control electrode arranged between a first pair out of the two or more trapping site DC electrodes. The first RF control electrode is configured to be individually driven by an adjustable RF voltage such that the trapping potential above and between the first pair of trapping site DC electrodes forms separate charged particle traps adapted for trapping charged particles therein if the adjustable RF voltage takes a first value, and forms a charged particle interaction trap adapted for performing controlled interactions between charged particles if the adjustable RF voltage takes a second value.