The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2013

Filed:

Apr. 20, 2010
Applicants:

Robert Froehlich, New Providence, NJ (US);

Ben Fieselmann, Bridgewater, NJ (US);

David Mixon, Port Murray, NJ (US);

York Tsuo, Livingston, NJ (US);

Inventors:

Robert Froehlich, New Providence, NJ (US);

Ben Fieselmann, Bridgewater, NJ (US);

David Mixon, Port Murray, NJ (US);

York Tsuo, Livingston, NJ (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/02 (2006.01); B01J 8/18 (2006.01); C01B 33/03 (2006.01);
U.S. Cl.
CPC ...
Abstract

In an embodiment, a reactor includes a section, wherein at least a portion of the section includes a base layer, wherein the base layer has a first composition that contains a silicide-forming metal element; and a silicide coating layer, wherein the silicide coating layer is formed by a process of exposing, at a first temperature above 600 degrees Celsius and a sufficient low pressure, the base layer having a sufficient amount of the silicide-forming metal element to a sufficient amount of a silicon source gas having a sufficient amount of silicon element, wherein the silicon source gas is capable of decomposing to produce the sufficient amount of silicon element at a second temperature below 1000 degrees Celsius; reacting the sufficient amount of the silicide-forming metal element with the sufficient amount of silicon element, and forming the silicide coating layer.


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