The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2013

Filed:

Sep. 08, 2008
Applicants:

Shunqiong Yue, San Diego, CA (US);

Anne Kelly-rowley, Midland, MI (US);

Dennis Z. Guo, San Diego, CA (US);

Inventors:

Shunqiong Yue, San Diego, CA (US);

Anne Kelly-Rowley, Midland, MI (US);

Dennis Z. Guo, San Diego, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention is drawn to systems and methods for suppressing damaging effects from dissolution of silica present in an ink-jet printhead which contains high pH, pigmented ink. The systems and methods suppress the damaging effects of dissolution of silica by the action of a basic ink by adding a metal ion to the ink composition which forms a complex with the silica. The metal ion passivates the silica thus retarding the dissolution of silica thereby reducing promotion of ink kogation, silicate ring formation, and silicate deposit on ink-jet printhead resistors which effectively improves durability and shelf life of the ink-jet printhead.


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