The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2013

Filed:

Jun. 15, 2010
Applicants:

Yuko Nishiwaki, Mitaka, JP;

Yoshio Nakajima, Yokohama, JP;

Yuhei Shimizu, Kawasaki, JP;

Tetsu Iwata, Yokohama, JP;

Katsuhiro Hayashi, Yokohama, JP;

Kenji Nishiguchi, Yokohama, JP;

Inventors:

Yuko Nishiwaki, Mitaka, JP;

Yoshio Nakajima, Yokohama, JP;

Yuhei Shimizu, Kawasaki, JP;

Tetsu Iwata, Yokohama, JP;

Katsuhiro Hayashi, Yokohama, JP;

Kenji Nishiguchi, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/17 (2006.01); G01D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is an ink jet clear ink containing a polymer fine particle. The polymer fine particle has a core-shell structure obtained by polymerizing an α,β-ethylenically unsaturated hydrophobic monomer (b) as a core polymer in the presence of a shell polymer that is a copolymer having at least a unit derived from an α,β-ethylenically unsaturated hydrophobic monomer (a) and a unit derived from a monomer selected from an α,β-ethylenically unsaturated acid monomer and a salt thereof. The α,β-ethylenically unsaturated hydrophobic monomer (b) includes at least a monomer containing a chain structure saturated alkyl group.


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