The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Mar. 08, 2010
Jed H. Rankin, Richmond, VT (US);
Andrew J. Watts, Essex, VT (US);
Jed H. Rankin, Richmond, VT (US);
Andrew J. Watts, Essex, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and system for designing a photomask. The method provides a single machine methodology for inspecting photomasks having regions that repeat and regions that do not repeat. The method includes generating a chip dataset representing an integrated circuit chip design to be included in a cell region of a photomask, generating a kerf dataset to be included in the cell region, generating a kerf copy dataset, and merging the chip dataset, the kerf dataset and the kerf copy dataset into a photomask dataset representing a pattern of clear and opaque regions of the photomask.