The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Jan. 20, 2010
Applicants:
Hung Hsuan Lin, Taipei, TW;
Chun Yih Wu, Taichung, TW;
Ken Huang Lin, Kaohsiung, TW;
Hsin Lung Su, Kaohsiung, TW;
Hung Chi Huang, Chaozhou Town, TW;
Inventors:
Hung Hsuan Lin, Taipei, TW;
Chun Yih Wu, Taichung, TW;
Ken Huang Lin, Kaohsiung, TW;
Hsin Lung Su, Kaohsiung, TW;
Hung Chi Huang, Chaozhou Town, TW;
Assignees:
Industrial Technology Research Institute, Chutung, Hsinchu, TW;
National Sun Yat-Sen University, Kaohsiung, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 15/02 (2006.01); H01Q 19/09 (2006.01); H01Q 21/24 (2006.01);
U.S. Cl.
CPC ...
Abstract
A dual polarization antenna radome includes a plurality of dielectric substrates. Each dielectric substrate provides a plurality of metal totems, and the pattern of the metal totems is unchanged after the metal totems rotate by 90 degrees around the axis perpendicular to the dielectric substrate.