The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Nov. 18, 2011
Tomotaka Ariga, Kawasaki, JP;
Yuichi Ohsawa, Yokohama, JP;
Junichi Ito, Yokohama, JP;
Yoshinari Kurosaki, Kawasaki, JP;
Saori Kashiwada, Yokohama, JP;
Toshiro Hiraoka, Yokohama, JP;
Minoru Amano, Sagamihara, JP;
Satoshi Yanagi, Kawasaki, JP;
Tomotaka Ariga, Kawasaki, JP;
Yuichi Ohsawa, Yokohama, JP;
Junichi Ito, Yokohama, JP;
Yoshinari Kurosaki, Kawasaki, JP;
Saori Kashiwada, Yokohama, JP;
Toshiro Hiraoka, Yokohama, JP;
Minoru Amano, Sagamihara, JP;
Satoshi Yanagi, Kawasaki, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A method of forming a concave-convex pattern according to an embodiment includes: forming a guide pattern on a base material, the guide pattern having a convex portion; forming a formative layer on the guide pattern, the formative layer including a stacked structure formed by stacking a first layer and a second layer, the first layer including at least one element selected from a first metal element and a metalloid element, the second layer including a second metal element different from the first metal element; selectively leaving the formative layer only at side faces of the convex portions by performing etching on the formative layer; removing the guide pattern; and forming the concave-convex pattern in the base material by performing etching on the base material, with the remaining formative layer being used as a mask.