The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Jun. 08, 2009
Yoon-sung Um, Yongin-si, KR;
Su-jeong Kim, Seoul, KR;
Hye-ran You, Incheon, KR;
Jae-jin Lyu, Yongin-si, KR;
Seung-beom Park, Seoul, KR;
Yoon-Sung Um, Yongin-si, KR;
Su-Jeong Kim, Seoul, KR;
Hye-Ran You, Incheon, KR;
Jae-Jin Lyu, Yongin-si, KR;
Seung-Beom Park, Seoul, KR;
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Abstract
A method of fine patterning a thin film and a method of manufacturing a display substrate by using the same, in which a fine photo pattern is formed on a base substrate, and a photoresist pattern is formed on the thin film. A fine photo pattern is formed by ashing the photoresist pattern. A fine pattern is formed by removing the thin film exposing through the fine photo pattern. A fine pattern is formed, and the fine pattern has a higher resolution than that of an exposure apparatus. The reliability of a process for manufacturing a display substrate and the display quality of a display device may be improved.