The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2013

Filed:

Jan. 14, 2011
Applicants:

Yuji Harada, Joetsu, JP;

Takeru Watanabe, Joetsu, JP;

Takeshi Sasami, Joetsu, JP;

Yuuki Suka, Joetsu, JP;

Koji Hasegawa, Joetsu, JP;

Inventors:

Yuji Harada, Joetsu, JP;

Takeru Watanabe, Joetsu, JP;

Takeshi Sasami, Joetsu, JP;

Yuuki Suka, Joetsu, JP;

Koji Hasegawa, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer to formulate a resist composition. Ris H, F, methyl, or trifluoromethyl, Ris a monovalent fluorinated hydrocarbon group, Ais a (n+1)-valent hydrocarbon or fluorinated hydrocarbon group, and n is 1, 2 or 3.


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