Substrate comprising a stack having thermal properties

Abstract

The invention relates to a substrate (), provided with a thin-film multilayer comprising an alternation of n functional layers () having reflection properties in the infrared and/or in solar radiation and (n+1) coatings (), where n is an integer ≧2, said coatings being composed of a plurality of dielectric layers (), so that each functional layer () is placed between two coatings (), at least two functional layers () each being deposited on a wetting layer () itself deposited respectively directly onto a subjacent coating (), characterized in that two subjacent coatings () each comprise at least one dielectric layer () and at least one noncrystalline smoothing layer () made from a material that is different from the material of said dielectric layer within each coating, said smoothing layer () being in contact with said superjacent wetting layer () and in that these two subjacent coatings () being of different thicknesses, the thickness of the smoothing layer () of the subjacent coating () that has a total thickness of less than that of the other subjacent coating () is less than or equal to the thickness of the smoothing layer () of this other subjacent coating ().