The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Mar. 23, 2010
Sun-zen Chen, Hsinchu, TW;
Wen-feng Kuo, Hsinchu, TW;
Ruo-ying Wu, Hsinchu, TW;
Yu-cheng Tzeng, Hsinchu, TW;
Ching-wen Chang, Hsinchu, TW;
Hong-jum Tan, Hsinchu, TW;
Sun-Zen Chen, Hsinchu, TW;
Wen-Feng Kuo, Hsinchu, TW;
Ruo-Ying Wu, Hsinchu, TW;
Yu-Cheng Tzeng, Hsinchu, TW;
Ching-Wen Chang, Hsinchu, TW;
Hong-Jum Tan, Hsinchu, TW;
National Tsing Hua University, Hsinchu, TW;
Abstract
Methods for preparing a patterned metal/metal oxide layer by using a solution type precursor or sol-gel precursor are provided and, especially, a method for preparing a patterned carrier transport of a solar cell and a method for preparing biomedical material are provided, which comprise the following steps: (A) providing a substrate, and a mold with designed patterns formed thereon; (B) coating the substrate with a solution of a precursor to form a precursor layer, wherein the precursor is a metal precursor or a metal oxide precursor; (C) pressing the mold together with the precursor layer to transfer the patterns of the mold onto the precursor layer; (D) curing or pre-curing the precursor layer; (E) removing the mold; and (F) conducting an optional post-treatment, if it being demanded, to further modify the properties of precursor layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile