The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Jun. 22, 2011
Masatoshi Sakurai, Tokyo, JP;
Kaori Kimura, Yokohama, JP;
Hiroyuki Hyodo, Hino, JP;
Takeshi Iwasaki, Inagi, JP;
Masatoshi Sakurai, Tokyo, JP;
Kaori Kimura, Yokohama, JP;
Hiroyuki Hyodo, Hino, JP;
Takeshi Iwasaki, Inagi, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to one embodiment, a method of manufacturing a patterned medium includes forming an implantation depth-adjusting layer above a magnetic recording layer, the magnetic recording layer being made of a material that is deactivated when implanted with a chemical species, and the implantation depth-adjusting layer being made of a material that is etched when irradiated with an ion beam of the chemical species and irradiating the implantation depth-adjusting layer with the ion beam to implant the chemical species into a part of the magnetic recording layer through the implantation depth-adjusting layer while etching the implantation depth-adjusting layer by an action of the ion beam to decrease a thickness of the implantation depth-adjusting layer.