The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Jan. 26, 2006
Hideki Yamashita, Mino, JP;
Takafumi Okuma, Hirakata, JP;
Hiroshi Hayata, Hirakata, JP;
Hitoshi Yamanishi, Higashiosaka, JP;
Tadashi Kimura, Kobe, JP;
Hirokazu Nakaue, Daito, JP;
Hideki Yamashita, Mino, JP;
Takafumi Okuma, Hirakata, JP;
Hiroshi Hayata, Hirakata, JP;
Hitoshi Yamanishi, Higashiosaka, JP;
Tadashi Kimura, Kobe, JP;
Hirokazu Nakaue, Daito, JP;
Panasonic Corporation, Osaka, JP;
Abstract
A deposition apparatus includes a processing chamber internally having a reduced-pressure space for deposition process to be carried out therein, a base material holding member for holding a base material to be subjected to the deposition process, a target support member for supporting a target thereon, and a power supply unit for applying electric power to the target support member to generate a plasma in the reduced-pressure space. In the deposition apparatus, deposition process is carried out by using the target, which has a recess portion in its surface and in which a powder target formed of a powder material is placed in an inner surface of the recess portion. Thus, the in-plane uniformity of deposition rate is improved and a stable film deposition is fulfilled.