The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2013

Filed:

Mar. 16, 2012
Applicants:

Yuichi Ohsawa, Yokohama, JP;

Junichi Ito, Yokohama, JP;

Tomotaka Ariga, Kawasaki, JP;

Yoshinari Kurosaki, Kawasaki, JP;

Saori Kashiwada, Yokohama, JP;

Inventors:

Yuichi Ohsawa, Yokohama, JP;

Junichi Ito, Yokohama, JP;

Tomotaka Ariga, Kawasaki, JP;

Yoshinari Kurosaki, Kawasaki, JP;

Saori Kashiwada, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

According to one embodiment, a nano-imprint mold includes plural pairs of first and second protrusions formed on a base layer, each of which is formed along the same straight line. Each protrusion has a top surface and four side surfaces. The first and second protrusions are mirror-symmetrical with each other. A first side surface of the first protrusion and a second side surface of the second protrusion face each other. A first angle between the first side surface or the second side surface and a main surface of the base layer is not less than 85° and not more than 90°. A second angle between a third side surface in the first protrusion or a fourth side surface in the second protrusion and the main surface of the base layer is not less than 70° and not more than 88°. The first angle is larger than the second angle.


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