The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Mar. 05, 2008
Osamu Nagase, Iwate, JP;
Yoshitsugu Kono, Iwate, JP;
Osamu Nagase, Iwate, JP;
Yoshitsugu Kono, Iwate, JP;
Ricoh Optical Industries, Co., Ltd., Hanamaki-shi, JP;
Abstract
An optical system with short total length to project a high quality large image. The system projects an image onto a projection surface, and includes a lens system having a plurality of lenses, and one or more curved mirrors. Light flux of an enlarged image shooting out from the lens system to the projection surface is incident onto a mirror surface of the one of the curved mirrors first of all. Distances OAL and Y satisfy a requirement 20 <OAL/Y<30. OAL is between the image surface and the surface of the curved mirror nearest the projection surface and along an optical path shared by the most lenses of the lens system, and on the image surface. Y is between the optical axis shared by the most lenses and an edge of the image surface which is farthest from the optical axis shared by the most lenses.