The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8418547 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 16, 2013

Filed:

Aug. 06, 2009
Applicants:

Jeffrey William Kysar, New York, NY (US);

James C. Hone, New York, NY (US);

Changgu Lee, New York, NY (US);

Xiaoding Wei, New York, NY (US);

Inventors:

Jeffrey William Kysar, New York, NY (US);

James C. Hone, New York, NY (US);

Changgu Lee, New York, NY (US);

Xiaoding Wei, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 5/04 (2006.01); G01L 7/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

Force, pressure, or stiffness measurement or calibration can be provided, such as by using a graphene or other sheet membrane, which can provide a specified number of monolayers suspended over a substantially circular well. In an example, the apparatus can include a substrate, including a substantially circular well. A deformable sheet membrane can be suspended over the well. The membrane can be configured to include a specified integer number of one or more monolayers. A storage medium can comprise accompanying information about the suspended membrane or the substrate that, with a deflection displacement response of the suspended membrane to an applied force or pressure, provides a measurement of the applied force or pressure.


Find Patent Forward Citations

Loading…