The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2013

Filed:

Feb. 12, 2010
Applicants:

Sang-wook OH, Ansan-si, KR;

Seong-taek Hwang, Pyeongtaek-si, KR;

Hyun-soo Kim, Yongin-si, KR;

Sang-ho Kim, Suwon-si, KR;

Guee-sang Lee, Gwangju, KR;

Soo-hyung Kim, Gwangju, KR;

Hyung-jeong Yang, Gwangju, KR;

Eui-chul Kim, Gwangju, KR;

Inventors:

Sang-Wook Oh, Ansan-si, KR;

Seong-Taek Hwang, Pyeongtaek-si, KR;

Hyun-Soo Kim, Yongin-si, KR;

Sang-Ho Kim, Suwon-si, KR;

Guee-Sang Lee, Gwangju, KR;

Soo-Hyung Kim, Gwangju, KR;

Hyung-Jeong Yang, Gwangju, KR;

Eui-Chul Kim, Gwangju, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of compensating for distortion in text recognition is provided, which includes extracting a text region from an image; estimating the form of an upper end of the extracted text region; estimating the form of a lower end of the extracted text region; estimating the form of left and right sides of the extracted text region; estimating a diagram constituted in the form of the estimated upper end, lower end, left and right sides, and including a minimum area of the text region; and transforming the text region constituting the estimated diagram into a rectangular diagram using an affine transform.


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