The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2013
Filed:
Apr. 27, 2010
Gilles Mathieu, Kennedy Town, HK;
Gilles Mathieu, Kennedy Town, HK;
FM-Assets Pty Ltd., Sydney, AU;
Abstract
An extended depth of field (EDOF) imaging system () is disclosed that has an optical system () consisting of a single lens element () having a focal length (F), a thickness (TH) between 0.25F and 1.2F, and an objectwise aperture stop (AS). The optical system has a select amount of spherical aberration (SA) that allows for correcting coma by positioning the aperture stop. The optical system has an amount of field curvature (FC) such that 20 microns≦FC≦300 microns, which is made possible by the thickness of the single lens element. The imaging system has an image sensor () and an image processing unit () adapted to process raw images to form contrast-enhanced images.