The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2013

Filed:

Jul. 26, 2011
Applicants:

John Eid, San Francisco, CA (US);

Devon Murphy, Mountain View, CA (US);

Geoffrey Otto, Brookline, MA (US);

Stephen Turner, Menlo Park, CA (US);

Inventors:

John Eid, San Francisco, CA (US);

Devon Murphy, Mountain View, CA (US);

Geoffrey Otto, Brookline, MA (US);

Stephen Turner, Menlo Park, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 9/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

Compositions, devices, systems and methods for reducing and/or preventing photodamage of one or more reactants in illuminated analytical reactions by one or more of incorporating photodamage mitigating agents within the reaction mixture and/or interrogating different observation regions of the reaction mixture for a period that is less than a photodamage threshold period.


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