The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8414983 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 09, 2013

Filed:

Aug. 10, 2007
Applicants:

Owain Llyr Parri, Hampshire, GB;

Alison Linda May, Dorset, GB;

Julian Vaughan-spickers, Southampton, GB;

Karl Skjonnemand, Southampton, GB;

Oleg Yaroshchuck, Kyiv, UA;

Inventors:

Owain Llyr Parri, Hampshire, GB;

Alison Linda May, Dorset, GB;

Julian Vaughan-Spickers, Southampton, GB;

Karl Skjonnemand, Southampton, GB;

Oleg Yaroshchuck, Kyiv, UA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/06 (2006.01); H05H 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method of aligning reactive mesogens (RM) on a substrate subjected to particle beam treatment, to RM's oriented by said method, especially in form of thin layers, to oriented polymers and polymer films obtained from such oriented RM's and RM layers, and to the use of the RM's, layers, polymers and films in optical, electronic and electrooptical applications.


Find Patent Forward Citations

Parri, Owain. (2013). Particle beam process for the alignment of reactive mesogens (U.S. Patent No. 8414983). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8414983

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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