The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2013
Filed:
Dec. 07, 2009
Applicants:
Xiaobo Shi, Chandler, AZ (US);
Bentley J. Palmer, Phoenix, AZ (US);
Rebecca A. Sawayda, Gilbert, AZ (US);
Fadi Abdallah Coder, Chandler, AZ (US);
Victoria Perez, Scottsdale, AZ (US);
Inventors:
Xiaobo Shi, Chandler, AZ (US);
Bentley J. Palmer, Phoenix, AZ (US);
Rebecca A. Sawayda, Gilbert, AZ (US);
Fadi Abdallah Coder, Chandler, AZ (US);
Victoria Perez, Scottsdale, AZ (US);
Assignee:
Air Products and Chemicals, Inc., Allentown, PA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A composition and associated method for chemical mechanical planarization of a metal-containing substrate (e.g., a copper substrate) are described herein which afford high and tunable rates of metal removal as well as low within a wafer non-uniformity values and low residue levels remaining after polishing.