The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2013

Filed:

Jul. 13, 2011
Applicant:

Saori Kudo, Kawaguchi, JP;

Inventor:

Saori Kudo, Kawaguchi, JP;

Assignee:

Tokiwa Corporation, Nakatsugawa-shi, Gifu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A45D 40/26 (2006.01); A45D 33/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

To quickly apply a mascara to cilia without unevenness, a state capable of applying a mascara (L) is more quickly achieved in comparison with a conventional art by constructing a guide path () guiding the mascara (L) extruded from an accommodating portion () as a straight linear route, and by opening an opening () flowing out the mascara (L) to the external on the linear route, and the mascara (L) is more evenly distributed between adjacent arch type applying portions () in comparison with the conventional art by opening the opening () on the linear route as mentioned above, and by structuring an applying body () for applying the mascara (L) to cilia as a plurality of arch type applying portions () which are arranged in line along the opening () while straddling the opening () from an outer side and have an arch shape.


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