The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2013
Filed:
Jan. 06, 2010
Tsutomu Yokouchi, Kanagawa-ken, JP;
Tsutomu Yokouchi, Kanagawa-ken, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A method of manufacturing a flow channel substrate, includes the steps of: forming two uneven shapes on a substrate in such a manner that the two uneven shapes follow a liquid flow channel at perimeters of a location where the liquid flow channel is to be formed and the two uneven shapes are configured to prevent a dissolvable resin forming a sacrificial layer from spreading during a heat treatment; forming, between the two uneven shapes on the substrate, the sacrificial layer which is made of the dissolvable resin and has a shape of the liquid flow channel; applying, by the heat treatment, a rounded shape to a corner section of the sacrificial layer on a side which is not in contact with the substrate; forming a coating resin layer on the substrate and the sacrificial layer; patterning the coating resin layer; and dissolving the dissolvable resin forming the sacrificial layer.