The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2013
Filed:
Aug. 29, 2005
Stephen F. Somerstein, Mountain View, CA (US);
Martina J. Reale, Palo Alto, CA (US);
Stephen F. Somerstein, Mountain View, CA (US);
Martina J. Reale, Palo Alto, CA (US);
Lockheed Martin Corporation, Bethesda, MD (US);
Abstract
A method for creating an apodization mask is disclosed. According to the method, a grid is created for the pattern. The grid includes a number of elements. Each element is processed to determine whether the element is to be made transmissive based on a predetermined local optical density and a random value. The predetermined local optical density and the random value are associated with the element. The random value is generated on a random basis. Each element is further processed to determine whether the position of the element is to be shifted. The positional shift is determined on a random basis. The grid with the processed elements is then used to make an apodization mask. The apodization mask may be used in an optical instrument, such as, an interferometer.