The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2013

Filed:

Mar. 23, 2006
Applicants:

Toshihisa Tanaka, Yokohama, JP;

Atsushi Tanaka, Fuchu, JP;

Yuko Kitade, Saitama-ken, JP;

Inventors:

Toshihisa Tanaka, Yokohama, JP;

Atsushi Tanaka, Fuchu, JP;

Yuko Kitade, Saitama-ken, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01);
U.S. Cl.
CPC ...
Abstract

While data that indicate a relationship between a dressing position P defined by a distance between a rotating shaftof a polishing padand a rotating shaftof a dresserand shape change of the polishing padbased on input of a target shape of the polishing padand alternating repetition of dressing the polishing padby the dresserand measurement of shape of the polishing padby a pad shape measurement instrumentis acquired at a stage prior to commencement of a series of polishing steps for continuously polishing a plurality of polishing target objects (semiconductor wafer W) by a polishing tool, the polishing padis machined to the target shapewhile the dressing position P is controlled, whereby the dressing position P is set during the polishing steps on the basis of a processing result of this data.


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