The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2013
Filed:
Feb. 28, 2008
Li-yi Wei, Redwood City, CA (US);
Baoquan Liu, Beijing, CN;
Xu Yang, Beijing, CN;
Ying-qing Xu, Beijing, CN;
Baining Guo, Redmond, WA (US);
Li-Yi Wei, Redwood City, CA (US);
Baoquan Liu, Beijing, CN;
Xu Yang, Beijing, CN;
Ying-Qing Xu, Beijing, CN;
Baining Guo, Redmond, WA (US);
Microsoft Corporation, Redmond, WA (US);
Abstract
A non-linear beam tracing technique that supports full non-linear beam tracing effects including multiple reflections and refractions for computer graphics applications. The technique introduces non-linear beam tracing to render non-linear ray tracing effects such as curved mirror reflection, refraction, caustics, and shadows. Beams are allowed to be non-linear where rays within the same beam are not parallel or do not intersect at a single point. Such is the case when a primary beam bounces off of a surface and spawns one or more secondary rays or beams. Secondary beams can be rendered in a similar manner to primary rays or beams via polygon streaming. Beyond smooth ray bundles, the technique can also be applied to incoherent ray bundles which is useful for rendering bump mapped surfaces.