The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2013

Filed:

Jun. 24, 2010
Applicants:

Wenwu Wang, Beijing, CN;

Huilong Zhu, Beijing, CN;

Shijie Chen, Beijing, CN;

Dapeng Chen, Beijing, CN;

Inventors:

Wenwu Wang, Beijing, CN;

Huilong Zhu, Beijing, CN;

Shijie Chen, Beijing, CN;

Dapeng Chen, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is provided a CMOSFET device with a threshold voltage controlled by means of its gate stack configuration and a method of fabricating the same. The CMOSFET device comprises: a semiconductor substrate; am interface layer grown on the silicon substrate; a first high-k gate dielectric layer deposited on the interface layer; a very thin metal layer deposited on the first high-k gate dielectric layer; a second high-k gate dielectric layer deposited on the very thin metal layer; and a gate electrode layer deposited on the second high-k gate dielectric layer.


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