The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2013
Filed:
Sep. 30, 2009
Kageyama Takeo, Tokyo, JP;
Norihiro Iwai, Tokyo, JP;
Koji Hiraiwa, Tokyo, JP;
Yoshihiko Ikenaga, Tokyo, JP;
Kageyama Takeo, Tokyo, JP;
Norihiro Iwai, Tokyo, JP;
Koji Hiraiwa, Tokyo, JP;
Yoshihiko Ikenaga, Tokyo, JP;
Furukawa Electric Co., Ltd, Tokyo, JP;
Abstract
According to a method of manufacturing a vertical-cavity surface-emitting semiconductor laser element in accordance with the present invention, a process of wet etching is performed for a part that is oxidized in a layer of an AlGaAs () which configures a layer having an index of refraction as lower and in which a composition of aluminum is designed to be as higher comparing to the other pairs of layers in a DBR mirror at an upper side that are formed at an inner side of a mesa post (). And then a process of filling up again is performed with making use of a layer of polyimide (). Moreover, an etchant that includes such as a hydrofluoric acid or a buffered hydrofluoric acid or an aqueous ammonia or the like is made use in order to perform such the process of wet etching.