The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2013
Filed:
May. 18, 2010
Kenji Hiratsuka, Yokohama, JP;
Kenji Hiratsuka, Yokohama, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Abstract
A method for producing a semiconductor optical device, includes the steps of: (a) forming a semiconductor region on a substrate, the substrate including first and second areas; the first area including device sections (b) forming a first mask on the semiconductor region, the first mask including first patterns periodically arranged in the first area and a second pattern provided in the second area; (c) forming a plurality of periodic structures in each of the device sections and a monitoring structure in the second area by using the first mask, the periodic structures respectively corresponding to the first patterns, the monitoring structure corresponding to the second pattern; (d) measuring a shape of the monitoring structure; (e) selecting a desired periodic structure from the plurality of periodic structures on a basis of a result of measuring the shape of the monitoring structure; (f) forming a second mask including a pattern on the desired periodic structure; and (g) forming stripe mesas including the desired periodic structure by using the second mask.