The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2013
Filed:
Oct. 26, 2010
Hyun-chul Lee, Yongin, KR;
Jin-han Park, Yongin, KR;
Hyung-sik Kim, Yongin, KR;
Won-kyu Lim, Yongin, KR;
Cheol-lae Roh, Yongin, KR;
Hyun-Chul Lee, Yongin, KR;
Jin-Han Park, Yongin, KR;
Hyung-Sik Kim, Yongin, KR;
Won-Kyu Lim, Yongin, KR;
Cheol-Lae Roh, Yongin, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
A laser induced thermal imaging (LITI) method, a method of patterning an organic layer using the same and a method of manufacturing an organic light emitting diode (OLED) display device using the same. The LITI method includes preparing a substrate including a transfer layer, preparing a donor substrate including a base film and a light-to-heat conversion layer disposed on the base film, aligning the substrate with the donor substrate, and irradiating laser to the base layer of the donor substrate. Here, the laser is irradiated to the base layer in a region excluding a region corresponding to a pattern to be formed on the substrate. Thus, according to the method, regardless of the size of the pattern to be formed and the size of the laser beam, stitching mura can be prevented.