The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Sep. 14, 2010
Ibrahim M. Elfadel, Cortlandt Manor, NY (US);
Ying Liu, Austin, TX (US);
Stanislav Polonsky, Putnam Valley, NY (US);
Amith Singhee, Yonkers, NY (US);
Ibrahim M. Elfadel, Cortlandt Manor, NY (US);
Ying Liu, Austin, TX (US);
Stanislav Polonsky, Putnam Valley, NY (US);
Amith Singhee, Yonkers, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method, system, and computer usable program product for detecting dose and focus variations during photolithography are provided in the illustrative embodiments. A test shape is formed on a wafer, the wafer being used to manufacture integrated circuits, the test shape being formed using a dose value and a focus value that are predetermined for the manufacturing. A capacitance of the test shape is measured. The capacitance is resolved to a second dosing value and a second focus value using an extraction model. A difference between the dosing value and the second dosing value is computed. A recommendation is made for dosing adjustment in the manufacturing based on the difference.