The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2013

Filed:

Feb. 20, 2009
Applicants:

Daniel J Ripin, Needham, MA (US);

Tso Yee Fan, Belmont, MA (US);

Anish K Goyal, Cambridge, MA (US);

John Hybl, Nahant, MA (US);

Inventors:

Daniel J Ripin, Needham, MA (US);

Tso Yee Fan, Belmont, MA (US);

Anish K Goyal, Cambridge, MA (US);

John Hybl, Nahant, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/09 (2006.01);
U.S. Cl.
CPC ...
Abstract

A solid-state gain element including a thin doped region in which an optical signal propagates through the thin doped region at a large angle with respect to the normal to the thin doped region, reflects at a boundary of the thin doped region, and passes through the thin doped region again. An optical pump beam propagates through the thin doped region also at a large angle with respect to the normal to the thin doped region. In one example, the gain element and source of the pump beam are configured such that there is total internal reflection of the pump beam at the boundary of the thin doped region for a second pumping pass through the thin doped region. In another example, an elliptically symmetric laser beam is used to create a circularly symmetric gain region in the thin doped region.


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