The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Oct. 28, 2009
Denis Cattelan, Antony, FR;
Enric Garcia-caurel, Paris, FR;
Antonello DE Martino, Massy, FR;
Bernard Drevillon, Clamart, FR;
Denis Cattelan, Antony, FR;
Enric Garcia-Caurel, Paris, FR;
Antonello De Martino, Massy, FR;
Bernard Drevillon, Clamart, FR;
HORIBA Jobin Yvon SAS, Longjumeau, FR;
Centre National de la Recherche Scientifique, Paris, FR;
Ecole Polytechnique, Palaiseau, FR;
Abstract
A spectroscopic polarimetric system of broad spectral range, includes a light source suitable for emitting an incident light beam over a wavelength range, a polarization state generator (PSG), a polarization state analyzer (PSA), and a detector. The PSG and the PSA have respective elements for modulating the polarization of the light beam. The elements of the PSG for modulating polarization are suitable for generating a sequence ofpolarization states with m>4 at each measurement wavelength, the elements of the PSA for modulating polarization are suitable for determining a sequence ofpolarization states with n>4 for each measurement wavelength, and the detector elements are suitable for acquiring a sequence of N measurements with 16<N≦n×m at each wavelength to extract therefrom a polarimetric spectroscopic measurement of the Mueller matrix of the sample. An extended spectroscopic polarimetric measurement method is also described.