The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Aug. 31, 2007
Wen-long Jang, Commerce, TX (US);
Chalita Ratanatawanate, Dallas, TX (US);
Wen-Long Jang, Commerce, TX (US);
Chalita Ratanatawanate, Dallas, TX (US);
The Texas A&M University System, College Station, unknown;
Abstract
Plasma modifications of catalyst supports before and after impregnation of metal precursors improve the activity, selectivity and stability of catalysts, e.g. Ni catalysts for benzene hydrogenation and Pd catalysts for selective hydrogenation of acetylene. Plasma modification of the support before impregnation is slightly more effective than the plasma modification after impregnation. However, plasma modifications after impregnation increase the stability and selectivity of catalysts more effectively. The economic benefit of much improved stability of Ni catalysts for hydrogenation of benzene and the enhanced activity and selectivity of Pd catalysts for acetylene hydrogenation, e.g., is significant. Similar benefits for various catalysts and other industrial processes via RF plasma techniques are expected.