The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Jul. 27, 2010
Noriharu Matsudate, Kujukuri, JP;
Takeshi Ookawara, Mobara, JP;
Noriharu Matsudate, Kujukuri, JP;
Takeshi Ookawara, Mobara, JP;
Hitachi Displays, Ltd., Chiba, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
In a metal processing method, a photoresist liquid is applied to both surfaces of a metal plate () to form photoresist films (), respectively (Step S). Subsequently, the photoresist films () are exposed and developed so that the photoresist films () is removed while leaving the photoresist films () corresponding to portions in which a hole is to be formed (Step S). Next, metal thin films () are formed on both the surfaces of the metal plate (), respectively, on which the photoresist films () are formed (Step S). Subsequently, the photoresist films () are removed, and metal thin films () are also removed, which are formed on the photoresist films (), respectively (Step S). Finally, the metal plate () is immersed in an etchant to be etched, to thereby form a high-precision hole in the metal plate () (Step S).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile