The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Nov. 29, 2010
Dan Xu, Waukesha, WI (US);
David Allen Langan, Clifton Park, NY (US);
Xiaoye Wu, Rexford, NY (US);
Jed Douglas Pack, Glenville, NY (US);
Andrea Marie Schmitz, Niskayuna, NY (US);
Dan Xu, Waukesha, WI (US);
David Allen Langan, Clifton Park, NY (US);
Xiaoye Wu, Rexford, NY (US);
Jed Douglas Pack, Glenville, NY (US);
Andrea Marie Schmitz, Niskayuna, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
Methods and systems for correlated noise suppression are presented. The present correlated noise suppression technique estimates a correlation direction between noise values in a first and a second MD image corresponding to a first and a second basis material, respectively. The two MD images are diffused using the estimated correlation direction to generate a first and a second diffused image. Further, first and second noise masks are generated by subtracting the diffused image from the corresponding MD image. Edges in the first and the second MD images are processed with the first and second noise masks, respectively to generate a final first noise mask and a final second noise mask. The first MD image is then processed with the final second noise mask to generate a final first MD image and the second MD image is processed with the final first noise mask to generate a final second MD image.