The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Nov. 24, 2010
Kyusik Shin, Pleasanton, CA (US);
Qiping Zhong, San Jose, CA (US);
Honglin Zhu, Fremont, CA (US);
Yingjian Chen, Fremont, CA (US);
Liubo Hong, San Jose, CA (US);
Fenglin Liu, Milpitas, CA (US);
Kyusik Shin, Pleasanton, CA (US);
Qiping Zhong, San Jose, CA (US);
Honglin Zhu, Fremont, CA (US);
Yingjian Chen, Fremont, CA (US);
Liubo Hong, San Jose, CA (US);
Fenglin Liu, Milpitas, CA (US);
HGST Netherlands B.V., Amsterdam, NL;
Abstract
Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.