The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Jul. 20, 2010
Chien-chung Fu, Hsinchu, TW;
Chien-Chung Fu, Hsinchu, TW;
National Tsing Hua University, Hsinchu, TW;
Abstract
A laser interference lithography apparatus capable of stitching small exposed areas into a large exposed area includes a body, a laser beam supplying unit, a reflecting mechanism, an L-shaped fixing mechanism and a substrate stage. The laser beam supplying unit fixed onto the body provides a laser beam. The reflecting mechanism is movably and rotatably mounted on the body. The L-shaped fixing mechanism mounted on the body includes a first mounting seat and a second mounting seat. An upright first reflecting mirror is fixed to the first mounting seat. The second mounting seat connected to the first mounting seat fixes a horizontal mask, and is substantially perpendicular to the first mounting seat. The substrate stage, movably mounted on the body and disposed below the second mounting seat, supports a substrate. Thus, a large-area pattern formed by stitching small-area patterns may be obtained.