The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
May. 28, 2007
Hiroyuki Tsuji, Kyoto, JP;
Kazuhiro Inoue, Osaka, JP;
Hiroyuki Tsuji, Kyoto, JP;
Kazuhiro Inoue, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
A first inert gas () is supplied into a reaction space () and a high-frequency power supply () applies a high-frequency electric field so that a primary plasma () composed of the first inert gas which has been made into the plasma is ejected from the reaction space. A mixed gas area () in which a mixed gas () having a second inert gas () as a main ingredient and a proper amount of a reactive gas () mixed is formed. The primary plasma collides into the mixed gas area to generate a secondary plasma () composed of the mixed gas which has been made into the plasma, and the secondary plasma is sprayed on a processed object (S) to carry out a plasma processing. Accordingly, the plasma processing is carried out in a wide range by an atmospheric pressure plasma generated by a small input power.