The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Oct. 28, 2009
Applicant:
Ho Sung Choi, Gyeonggi-do, KR;
Inventor:
Ho Sung Choi, Gyeonggi-do, KR;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/26 (2006.01); C11D 7/32 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photoresist residue removal composition is provided. The photoresist residue removal composition essentially contains glycolic and water, to which a pH control agent and/or a cleanability improver is selectively added. The photoresist residue removal composition has a high capability to remove residues caused by plasma etching and ashing of a metal or silicon oxide layer under a photoresist pattern, does not cause corrosion, and is eco-friendly.
Choi, Ho. (2013). Photoresist residue removal composition (U.S. Patent No. 8399391). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8399391
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile