Method for the selective doping of silicon and silicon substrate treated therewith

Abstract

A method for the selective doping of silicon of a silicon substrate () for producing a pn-junction in the silicon is characterized by the following steps: a) Providing the surface of the silicon substrate () with a doping agent () based on phosphorous, b) heating the silicon substrate () for creating a phosphorous silicate glass () on the surface of the silicon, wherein phosphorous diffuses into the silicon as a first doping (), c) applying a mask () on the phosphorous silicate glass (), covering the regions () that are later highly doped, d) removing the phosphorous silicate glass () in the non-masked regions, e) removing the mask () from the phosphorous silicate glass (), f) again heating for the further diffusion of phosphorous from the phosphorous silicate glass () into the silicon as a second doping for creating the highly doped regions (), g); complete removal of the phosphorous silicate glass () from the silicon.