The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Oct. 02, 2008
Dominique Bertrand, Cernay, FR;
Chouaib Boukaftane, Mulhouse, FR;
Christian Grab, Emmenbrucke, CH;
Other;
Abstract
The invention relates to a method of producing a relief image arrangement, usable especially in the fields of flexography, embossing and heliogravure, and comprising a base layer and a layer of photosensitive material fixed on the base layer. The method is of the type according to which an image is produced on the photosensitive layer by causing selective curing by irradiating the zones that are to be in relief with light of a predetermined wavelength. The method is characterized in that the image is produced in the form of a set of points to which a substantially pyramidal shape is given, widening out in the direction of the base layer (). The invention is usable for producing relief images, in the field of flexography.