The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Sep. 20, 2011
Kyoung Taek Kim, Incheon, KR;
Hyun Woo Kim, Seongnam-si, KR;
Sang Ouk Kim, Daejeon, KR;
Shi Yong Yi, Seongnam-si, KR;
Seong Woon Choi, Suwon-si, KR;
Kyoung Taek Kim, Incheon, KR;
Hyun Woo Kim, Seongnam-si, KR;
Sang Ouk Kim, Daejeon, KR;
Shi Yong Yi, Seongnam-si, KR;
Seong Woon Choi, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a block copolymer on the first and second regions, the block copolymer including a first component and a second component, the first component of the block copolymer being aligned on the first regions, and selectively removing one of the first component and the second component of the block copolymer to form a second pattern having a pitch that is less than a pitch of a first region and an adjacent second region.