The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Jun. 02, 2009
Wolfgang Lortz, Waechtersbach, DE;
Gabriele Perlet, Grosskrotzenburg, DE;
Uwe Diener, Grosskrotzenburg, DE;
Sascha Reitz, Hanau, DE;
Wolfgang Lortz, Waechtersbach, DE;
Gabriele Perlet, Grosskrotzenburg, DE;
Uwe Diener, Grosskrotzenburg, DE;
Sascha Reitz, Hanau, DE;
Evonik Degussa GmbH, Essen, DE;
Abstract
Provided is a process for preparing surface-modified silicon dioxide particles with a mean particle diameter of at most 100 nm, involving (A) high-pressure grinding of a predispersion having (i) surface-modified silicon dioxide particles which are at least partly aggregated, are bonded to the surface-modifying component via Si—O—Si bonds, and still have reactive groups on their surface; (ii) an organosilicon compound which has a silicon-carbon bond and a functional group which can react with the reactive groups to form a covalent Si—O—Si bond; and (iii) a solvent, to form a dispersion; and (B) removing the liquid phase of the dispersion. Also provided are redispersible, surface-modified silicon dioxide particles obtained by this process, and their use in toner powders, silicone rubber, adhesives, and scratch-resistance surface coatings.