The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Jul. 31, 2009
Stuart Ross Wenham, Kyle Bay, AU;
Alison Lennon, Rozelle, AU;
Roland Yudadibrata Utama, Singapore, SG;
Anita Wing Yi Ho-baillie, Lane Cove, AU;
Stuart Ross Wenham, Kyle Bay, AU;
Alison Lennon, Rozelle, AU;
Roland Yudadibrata Utama, Singapore, SG;
Anita Wing Yi Ho-Baillie, Lane Cove, AU;
Newsouth Innovations Pty Ltd., Sydney, AU;
Abstract
A method is provided for forming an opening in a layer of a selected material. The method comprises, forming a polymer resist layer over said selected material and plasticising areas of the resist where openings are to be formed. The plasticising is performed by depositing a first solution onto the surface of said polymer resist layer, where the first solution is a plasticiser selected to increase permeability of the polymer resist layer to a second solution, in an area which has absorbed the first solution. The second solution is selected to be an etchant or solvent for the selected material. After the resist layer has been selectively plasticised, it is contacted with the second solution, which permeates the polymer resist layer in the area of increased permeability and forms an opening in the selected material.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile